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ICU ENT Surgical instruments Low Temperature Plasma rf Ablation System

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SUCE (HONG KONG) IMPORT AND EXPORT LIMITED

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ICU ENT Surgical instruments Low Temperature Plasma rf Ablation System

Name: ICU ENT Surgical instruments Low Temperature Plasma rf Ablation System
Brand: SUCE
Price: 5899.00 USD

China ICU ENT Surgical instruments Low Temperature Plasma rf Ablation System wholesale

Place of Origin : China

Brand Name : SUCE

Model Number : RFS01

Packaging Details : Standard Export box package

Supply Ability : 10000 Set/Month

Price : $5899.00 - $6,799.00/Sets

Certification : CE,ISO13485

MOQ : 1pc

Payment Terms : T/T, Western Union,Payoneer

Delivery Time : about 10 days

Power Source : Electric

Warranty : 1 Year

After-sale Service : Free spare parts

Material : Metal, Plastic

Shelf Life : 1years

Quality Certification : ce

Instrument classification : Class I

Safety standard : EN 149 -2001+A1-2009

Product name : Low Temperature Plasma Ablation System

Standard accessory : hand piece transducer ,.foot switch ,hand piece scalpel

Application : general surgery, urology / gynecology

Weight : 12kg

Dimension : 58*58*25cm

Driving frequency : 55.5KHz

Trolley : optional

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ENT Surgical instrument Low Temperature Plasma rf Ablation

System for ICU RFS01

ICU ENT Surgical instruments Low Temperature Plasma rf Ablation System

Introduction

To address the need for an alternative to major surgery, we offer the Low Temperature Plasma Ablation System using low thermal plasma-mediated ablation technology to precisely cope with lesions of soft-tissue types via molecular disintegration.

Such surgery system consists of a Controller which generates the ablation energy, Plasma Wand(s) and Patient Cable for single use, Foot Control, and a Flow Control Valve Unit. The Controller is designed to deliver ablation energy to the active electrode(s) at the distal end of the Plasma Wand.

It works either at a lower voltage, creating a non-plasma-forming working condition, causing tissue shrinkage, or at a higher voltage plasma-forming condition that can cut tissue rapidly with minimal collateral tissue damage. The Controller functons under a radiofrequency excitation frequency of 100 kHz. The Plasma Wand is a bipolar surgical device. It is disposable and available in different configurations consisting of multiple electrodes.

Low Temperature Plasma rf Ablation

System

Functional Features:

Universal utilities in ENT, Spinal and
Arthroscopic procedures

* Performing gentle, precise softtissueremoval at low temperatures (between 40° and 70°C) in the well defined area

* Multiple functions: ablation(low temperature plasma excision),cutting, coagulation and hemostasis

* Bipolar energydelivery provides enhancedcontrol and precision, eliminating the need for patient return pad

* Multi-electrode technology

* Low operating frequency- 100kHz

* A wide selection ofPlasmaWands: available in different sizes and configurations to meet different anatomical needs of specific
surgical procedures

* Versatile Wand combining integrated ablation, suction, saline irrigation, and hemostasis capabilities allows for efficient
procedure

* All-screen LCD displaydemonstrates operating modes, Controller set points and error messages

* Flow control valve unit ensures procedural convenience

* Foot Control maximizes user efficiency and OR flexibility

* Unique square waveformdeliversablation energy more rapidly

* Easy set-up procedure guarantees OR efficiency

* PFC circuit helps reduce environmental risks

Technical data

System Name	System Model	Component name	Component models	Remark
Ultrasonic Scalpel System	US07V	generator	US07V	Driving frequency: 55.5KHz
				hand piece transducer	HPT55.5S	Connection gun type of Hand piece scalpel
				hand piece transducer		HPT55.5B	Connect the scissors type of Hand piece scalpel
				foot switch	FSW01	Anti-infusion IPX8
				hand piece scalpel	HPS36P	5mm For laparoscopic surgery
						HPS23P	5mm For open surgery
						HPS14P	5mm For superficial surgery
						HPS9B	For superficial surgery

We provide high quality products which fully meet the manufacture standard and market requirement within the industry:

* Our plasma equipment and devices have been granted the CE mark
* The Plasma Wand is intended for all types of energy generator
* Our product portfolios cover multiple clinical specialties, including ENT, Sports Medicine and Spine Surgery
* Compared with traditional RF-based techniques, the low temperature plasma ablation technology functions at a remarkably lower surgical temperaure, and removes tissue gently in a minimally invasive fashion, causing less pain and allowing rapid post-op recovery

Our product features more sophisticated design:

* Specially-designed waveform: Our System functions on the designing basis of a unique waveform. Compared with other controllers using the conventional waveform, our Controller is able to generate more efficient soft tissue ablation. Since this specially designed waveform has a sharp leading edge, it requires less time to generate the plasma needed, and therefore allows more time for effective tissue ablation. In contrast, the conventional waveform requires more time to reach the plasma threshhold, thus allowing less time to treat the undesired tissue.

* Lower excitation frequency: As frequency increases, tissue impedance decreases. When a higher frequency is employed, a larger amount of electrical current will flow deeper through the tissue. This means that as the frequency increases, the risk of undesired tissue penetration and regional thermal damage also increases.

With our cutting-edge technology, we offer patients and surgeons ideal surgical solutions:

* Lower electrical excitation frequency (100KHz) helps minimize damage to the adjacent healthy tissues
* Special waveform dramatically increases the ablation efficiency
* Bipolar energy delivery prevents current path from flowing through the patient’s body, causing less thermal damage to the
surrounding tissue, and guarantees higher ablation rate and improved surgical visualization
* Multi-electrode design helps create stable plasma field in a shorter time period

Detailed Images

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